DIN ISO 9277 Determination of the specific surface area of solids by gas adsorption - BET method (ISO 9277:2010)
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- Техэксперт: Машиностроительный комплекс
- Картотека зарубежных и международных стандартов
- DIN 50451-6 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH4F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- 29
- DIN 50451-6 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH4F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- 29.045
- DIN 50451-6 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH4F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 50451-6 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH4F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid
- DIN 50451-6 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH4F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid
- DIN 51456 Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- 31
- DIN 51456 Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 51456 Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
- DIN 50451-5 Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN 50451-3 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN EN ISO 17294-2 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
- DIN 19643-1 Treatment of water of swimming pools and baths - Part 1: General requirements
- DIN 19643-2 Treatment of water of swimming pools and baths - Part 2: Combinations of process with fixed bed filters and precoat filters
- DIN 19645 Treatment of spent filter backwash water from systems for treatment of water of swimming pools and baths
- DIN 19643-4 Treatment of water of swimming pools and baths - Part 4: Combinations of process with ultrafiltration
- DIN 50451-6 Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH4F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid
- Картотека зарубежных и международных стандартов
Deutsches Institut fur Normung e. V.
Determination of the specific surface area of solids by gas adsorption - BET method (:2010)
N ISO 9277
Annotation
This International Standard specifies the determination of the overall (see Note) specific external and internal surface area of disperse (e.g. nano-powders) or porous solids by measuring the amount of physically adsorbed gas according to the Brunauer, Emmett and Teller (BET) method (see Reference [1]). It takes account of the International Union for Pure and Applied Chemistry (IUPAC) recommendations of 1984 and 1994 (see References [7][8]).
NOTE For solids exhibiting a chemically heterogeneous surface, e.g. metal-carrying catalysts, the BET method gives the overall surface area, whereas the metallic portion of the surface area can be measured by chemisorption methods.
The BET method is applicable only to adsorption isotherms of type II (disperse, nonporous or macroporous solids) and type IV (mesoporous solids, pore diameter between 2 nm and 50 nm). Inaccessible pores are not detected. The BET method cannot reliably be applied to solids which absorb the measuring gas.
A strategy for specific surface area determination of microporous materials (type I isotherms) is described in Annex C.
Автоматический перевод:
Определение специфической поверхности твердых тел посредством газовой адсорбции - процесс BET (ИЗО 9277:2010)



