ASTM E1162 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
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Данный раздел/документ содержится в продуктах:
- Техэксперт: Машиностроительный комплекс
- Картотека зарубежных и международных стандартов
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 71
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 71.040
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 71.040.40
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 01
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 14606 Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials - Second edition
- ASTM E1127 Standard Guide for Depth Profiling in Auger Electron Spectroscopy
- ASTM E1636 Standard Practice for Analytically Describing Depth-Profile and Linescan-Profile Data by an Extended Logistic Function
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- Картотека зарубежных и международных стандартов
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- ASTM E1634 Standard Guide for Performing Sputter Crater Depth MeasurementsТипичный гид для измерений глубины кратера Performing Sputter
Карточка документа - ASTM E1636 Standard Practice for Analytically Describing Depth-Profile and Linescan-Profile Data by an Extended Logistic FunctionОбщепринятая практика для аналитичного описания профиля глубины и данных Linescan-профиля расширенной логистической функцией
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