IEC 60759 Standard Test Procedures for Semiconductor X-Ray Energy Spectrometers - Bilingual; First Edition; Amendment 1: 1991
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Данный раздел/документ содержится в продуктах:
Данный раздел/документ содержится в продуктах:
- Техэксперт: Машиностроительный комплекс
- Картотека зарубежных и международных стандартов
- BSI BS ISO 16700 Microbeam analysis Scanning electron microscopy Guidelines for calibrating image magnification
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- BSI BS ISO 16700 Microbeam analysis Scanning electron microscopy Guidelines for calibrating image magnification
- 37.020
- BSI BS ISO 16700 Microbeam analysis Scanning electron microscopy Guidelines for calibrating image magnification
- ISO TS 24597 Microbeam analysis — Scanning electron microscopy — Methods of evaluating image sharpness - First Edition
- ISO TS 24597 Microbeam analysis — Scanning electron microscopy — Methods of evaluating image sharpness - First Edition
- ISO TS 24597 Microbeam analysis — Scanning electron microscopy — Methods of evaluating image sharpness - First Edition
- ISO 16700 Microbeam analysis Scanning electron microscopy Guidelines for calibrating image magnification - First Edition
- BSI BS ISO 22309 Microbeam analysis - Quantitative analysis using energy-dispersive spectrometry (EDS) for elements with an atomic number of 11 (Na) or above
- BSI BS ISO 15632 Microbeam analysis - Selected instrumental performance parameters for the specification and checking of energy-dispersive X-ray spectrometers for use in electron probe microanalysis
- Картотека зарубежных и международных стандартов
IEC 60759 Standard Test Procedures for Semiconductor X-Ray Energy Spectrometers - Bilingual; First Edition; Amendment 1: 1991
