ASTM E983 Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
Данный раздел/документ содержится в продуктах:
- Техэксперт: Машиностроительный комплекс
- Картотека зарубежных и международных стандартов
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
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- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 71.040
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 71.040.40
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 01
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 14606 Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials - Second edition
- ASTM E1127 Standard Guide for Depth Profiling in Auger Electron Spectroscopy
- ASTM E996 Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- Картотека зарубежных и международных стандартов
ASTM International
Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
N E983
Annotation
This guide outlines the origins and manifestations of unwanted electron beam effects in Auger electron spectroscopy (AES).
Some general guidelines are provided concerning the electron beam parameters which are most likely to produce these effects and suggestions are offered on how to minimize them.
General classes of materials are identified which are most likely to exhibit unwanted electron beam effects. In addition, a tabulation of some specific materials which have been observed to undergo electron damage effects is provided.
A simple method is outlined for establishing the existence and extent of these effects during routine AES analysis.
The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Автоматический перевод:
Типичный гид для уменьшения нежелательных электронно-лучевых эффектов в спектроскопии электрона сверла
