ASTM E995 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
Данный раздел/документ содержится в продуктах:
- Техэксперт: Машиностроительный комплекс
- Картотека зарубежных и международных стандартов
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
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- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 71.040
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 71.040.40
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- 01
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 18115-1 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy - First Edition
- ISO 16531 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS - First Edition
- ISO 14606 Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials - Second edition
- ASTM E1127 Standard Guide for Depth Profiling in Auger Electron Spectroscopy
- ASTM E996 Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
- ISO 14606 Surface Chemical Analysis - Sputter Depth Profiling - Optimization Using Layered Systems as Reference Materials - First Edition
- Картотека зарубежных и международных стандартов
ASTM International
Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
N E995
Annotation
The purpose of this guide is to familiarize the analyst with the principal background subtraction techniques presently in use together with the nature of their application to data acquisition and manipulation.
This guide is intended to apply to background subtraction in electron, X-ray, and ion-excited Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS).
The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Автоматический перевод:
Типичный гид для фоновых методов вычитания в спектроскопии фотоэлектрона спектроскопии и рентгеновских лучей электрона сверла
Цель этого руководства состоит в том, чтобы ознакомить аналитика из основных фоновых методов вычитания в настоящее время в использовании вместе с природой их приложения к сбору данных и управлению.



